RATE OF ELECTROLESS COPPER DEPOSITION BY FORMALDEHYDE REDUCTION

被引：49
|
作者：
DUMESIC, J [1 ]
KOUTSKY, JA [1 ]
CHAPMAN, TW [1 ]
机构：
[1] UNIV WISCONSIN, DEPT CHEM ENGN, MADISON, WI 53706 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 11期
关键词：
D O I：
10.1149/1.2401698
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1405 / 1412
页数：8
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