EDGE PROFILES IN THE PLASMA-ETCHING OF POLYCRYSTALLINE SILICON

被引：34

作者：

ADAMS, AC

CAPIO, CD

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 02期

关键词：

D O I：

10.1149/1.2127423

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：366 / 370

页数：5

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