PREPARATION OF AIN COATINGS ON MO BY RF-REACTIVE ION PLATING - THE DEPOSITION MECHANISM

被引：11

作者：

KITAJIMA, M

FUKUTOMI, M

OKADA, M

WATANABE, R

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 07期

关键词：

D O I：

10.1149/1.2127688

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1588 / 1595

页数：8

共 26 条

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