IMPURITY DIFFUSION OUT OF IMPLANTED LAYERS OF SILICON UNDER CONDITIONS OF RAPID PULSED ANNEALING

被引：0

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ALEKSANDROV, OV

KOZLOVSKII, VV

POPOV, VV

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INORGANIC MATERIALS | 1990年 / 26卷 / 06期

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T [工业技术];

学科分类号：

08 ;

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页码：961 / 963

页数：3

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