STRESS IN VAPOR-DEPOSITED NICKEL FILMS

被引：4
|
作者：
SCHWARTZMAN, AM
DANTONIO, C
机构：
来源：
THIN SOLID FILMS | 1968年 / 2卷 / 03期
关键词：
D O I：
10.1016/0040-6090(68)90005-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：247 / +
页数：1
相关论文
共 50 条
  • [1] COMMENTS ON STRESS IN VAPOR-DEPOSITED NICKEL FILMS
    KLOKHOLM, E
    THIN SOLID FILMS, 1969, 4 (01) : R9 - &
  • [2] STRENGTH OF VAPOR-DEPOSITED NICKEL FILMS
    DANTONIO, C
    TARSHIS, L
    HIRSCHHORN, JS
    TRANSACTIONS OF THE METALLURGICAL SOCIETY OF AIME, 1963, 227 (06): : 1346 - &
  • [3] ANNEALING BEHAVIOR OF VAPOR-DEPOSITED NICKEL FILMS
    KIES, FK
    DANTONIO, C
    GRUNES, RL
    TRANSACTIONS OF THE METALLURGICAL SOCIETY OF AIME, 1965, 233 (10): : 1899 - &
  • [4] STRESS IN THIN FILMS OF SILANE VAPOR-DEPOSITED SILICON DIOXIDE
    LATHLAEN, R
    DIEHL, DA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (05) : 620 - &
  • [5] PIEZORESISTIVITY IN VAPOR-DEPOSITED DIAMOND FILMS
    ASLAM, M
    TAHER, I
    MASOOD, A
    TAMOR, MA
    POTTER, TJ
    APPLIED PHYSICS LETTERS, 1992, 60 (23) : 2923 - 2925
  • [6] VAPOR-DEPOSITED FILMS AND INDUSTRIAL APPLICATIONS
    BERNUS, FV
    FRELLER, H
    GUNTHER, KG
    THIN SOLID FILMS, 1978, 50 (MAY) : 39 - 48
  • [7] Morphology of Vapor-Deposited Acetonitrile Films
    Tylinski, M.
    Smith, R. Scott
    Kay, Bruce D.
    JOURNAL OF PHYSICAL CHEMISTRY A, 2020, 124 (30): : 6237 - 6245
  • [8] HIGH DUCTILITIES IN PHYSICALLY VAPOR-DEPOSITED NICKEL
    SPINGARN, JR
    JACOBSON, BE
    NIX, WD
    THIN SOLID FILMS, 1977, 45 (03) : 507 - 515
  • [9] STRUCTURE OF ELECTROPLATED AND VAPOR-DEPOSITED COPPER FILMS
    GANGULEE, A
    JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) : 867 - +
  • [10] ELECTRICAL RESISTIVITY OF VAPOR-DEPOSITED SILVER FILMS
    REICHMAN, SH
    DANTONIO, C
    TRANSACTIONS OF THE METALLURGICAL SOCIETY OF AIME, 1968, 242 (01): : 160 - &
12345