LOW-TEMPERATURE EPITAXY OF BETA-SIC BY REACTIVE DEPOSITION

被引:36
作者
LEARN, AJ
HAQ, KE
机构
关键词
D O I
10.1063/1.1653238
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:26 / &
相关论文
共 9 条
[1]  
Bartlett R. W., 1969, MATER RES B, V4, pS341
[2]  
BERMAN I, 1969, MAT RES B, V4, pS107
[3]   ETCHING OF ALPHA-SILICON CARBIDE [J].
BRANDER, RW ;
BOUGHEY, AL .
BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (07) :905-&
[4]   CHEMICAL PROCESSES IN SIC FORMATION BY REACTIVE DEPOSITION AND CHEMICAL CONVERSION [J].
HAQ, KE ;
LEARN, AJ .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) :431-&
[5]  
Khan I.H., 1969, MATER RES B, V4, pS285
[6]   FORMATION OF EPITAXIAL BETA-SIC FILMS ON SAPPHIRE [J].
KHAN, IH ;
LEARN, AJ .
APPLIED PHYSICS LETTERS, 1969, 15 (12) :410-&
[7]   REACTIVE DEPOSITION OF CUBIC SILICON CARBIDE [J].
LEARN, AJ ;
HAQ, KE .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) :430-&
[8]  
LEARN AJ, TO BE PUBLISHED
[9]  
SPIELMANN W, 1965, Z ANGEW PHYSIK, V19, P93