VHF-GD A-SI-H FILMS PREPARED AT VERY LOW-TEMPERATURE

被引：4
|
作者：
ZIEGLER, Y
CURTINS, H
BAUMANN, J
SHAH, A
机构：
来源：
AMORPHOUS SILICON TECHNOLOGY - 1989 | 1989年 / 149卷
关键词：
D O I：
10.1557/PROC-149-81
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：81 / 86
页数：6
相关论文
共 50 条
  • [1] NATURE OF DEEP DEFECTS IN BULK VHF-GD A-SI-H
    FAVRE, M
    SHAH, A
    HUBIN, J
    BUSTARRET, E
    HACHICHA, MA
    BASROUR, S
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 335 - 338
  • [2] HIGH-RATE DEPOSITION OF A-SI-H FILMS FOR OPTOELECTRONIC DETECTORS BY VHF-GD
    LEUTZ, B
    KEPPNER, H
    VIRET, V
    FISCHER, D
    SAUVAIN, E
    SHAH, A
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 115 (1-3) : 93 - 95
  • [3] EXPLOSIVE ISOTHERMAL HYDROGEN EXODIFFUSION IN VHF-GD A-SI-H THICK LAYERS
    BUSTARRET, E
    BRANDT, M
    STUTZMANN, M
    FAVRE, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 53 - 56
  • [4] LOW-TEMPERATURE PHOTOCONDUCTIVITY IN A-SI-H FILMS
    HOHEISEL, M
    CARIUS, R
    FUHS, W
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 457 - 460
  • [5] LOW-TEMPERATURE DIFFUSION OF PLATINUM IN A-SI-H FILMS
    ABRAMOV, VO
    KULIKOV, GS
    TERUKOV, EI
    KHODZHAEV, KK
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1985, 19 (02): : 224 - 225
  • [6] PHOTOCONDUCTIVITY AND PHOTOLUMINESCENCE OF A-SI-H AT LOW-TEMPERATURE
    HOHEISEL, M
    CARIUS, R
    FUHS, W
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1984, 63 (03) : 313 - 319
  • [7] CHARACTERISTICS OF LOW-TEMPERATURE PHOTOLUMINESCENCE OF A-SI-H
    ANDREEV, AA
    ZHERZDEV, AV
    KOSAREV, AI
    PEVTSOV, AB
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1987, 21 (11): : 1175 - 1177
  • [8] LOW-TEMPERATURE TRANSPORT AND RECOMBINATION IN A-SI-H
    STACHOWITZ, R
    FUHS, W
    JAHN, K
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1990, 62 (01): : 5 - 18
  • [9] PERSISTENT PHOTOCONDUCTIVITY IN A-SI-H/A-SINX-H MULTILAYER FILMS AT LOW-TEMPERATURE
    WANG, W
    LIAO, KJ
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1989, 113 (02): : K223 - K226
  • [10] EFFECT OF LOW-TEMPERATURE ANNEALING ON THE SURFACE-STATE OF A-SI-H FILMS
    ISHIKAWA, K
    OKADA, K
    AKIMOTO, M
    GEKKA, Y
    APPLIED SURFACE SCIENCE, 1993, 70-1 (1 -4 pt B) : 691 - 694
12345