ADSORPTIVE STRIPPING VOLTAMMETRIC MEASUREMENTS OF TRACE NIOBIUM LEVELS FOLLOWING CHELATION WITH CUPFERRON

被引:9
作者
WANG, J
LU, JM
TAHA, Z
机构
[1] Department of Chemistry, New Mexico State University, Las Cruces, New Mexico
关键词
NIOBIUM; ADSORPTIVE STRIPPING VOLTAMMETRY; CUPFERRON; VANADIUM;
D O I
10.1002/elan.1140041011
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Trace levels of niobium can be determined by adsorptive stripping voltammetry, with controlled interfacial accumulation of the niobium/cupferron complex onto the hanging mercury drop electrode. Optimal conditions (5 x 10(-6) M cupferron in acetate buffer (pH 4.0), a preconcentration potential of -0.2 V, and differential pulse stripping) allow convenient quantitation of mug/L (ppb) concentrations. The detection limit is 83 ppt (10 minute preconcentration); the response is linear over the 0-20 ppb range: and the relative standard deviation (at the 5 ppb level) is 2.0%. Most cations do not interfere in the determination of niobium. Complexation with cupferron also allows analogous trace measurements of vanadium.
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页码:981 / 985
页数:5
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