LOW-ENERGY ION-BEAM OXIDATION OF SILICON

被引：18
|
作者：
TODOROV, SS
SHILLINGER, SL
FOSSUM, ER
机构：
来源：
IEEE ELECTRON DEVICE LETTERS | 1986年 / 7卷 / 08期
关键词：
D O I：
10.1109/EDL.1986.26442
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：468 / 470
页数：3
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