OPTICAL-BREAKDOWN OF QUARTZ GLASS BY XEF LASER-RADIATION

被引:0
作者
AMOSOV, AV [1 ]
BARABANOV, VS [1 ]
GERASIMOV, SY [1 ]
MOROZOV, NV [1 ]
SERGEEV, PB [1 ]
STEPANCHUK, VN [1 ]
机构
[1] SI VAVILOV STATE OPT INST,ST PETERSBURG,RUSSIA
来源
KVANTOVAYA ELEKTRONIKA | 1994年 / 21卷 / 04期
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D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The bulk (volume) optical strengths of KU1 and KUVI quartz glasses were determined for pulses of 85 ns duration at the wavelength of 353 nm. The damage thresh-olds of these materials were the same and amounted to 280 GW cm-2. The optical breakdown thresholds of KU1 at lambda = 248 nm and lambda = 193 nm, obtained earlier for the same samples under otherwise identical conditions, were used together with the present results to plot the wavelength dependence of the damage threshold of this material. These results showed that nonlinear absorption is the main mechanism responsible for damage to quartz glass in high-intensity ultraviolet laser radiation fields.
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页码:329 / 332
页数:4
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