REASSIGNMENT OF THE SI2- PHOTODETACHMENT SPECTRA

被引：64

作者：

ARNOLD, CC

KITSOPOULOS, TN

NEUMARK, DM

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1993年 / 99卷 / 01期

关键词：

D O I：

10.1063/1.465757

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：766 / 768

页数：3

共 7 条

[1] THE RELATIVE STABILITY OF 2-SIGMA+ AND 2-PI STATES IN THE SYSTEMS CSI-, SI2-, SIP AND P-2+ AS PREDICTED IN MRD-CI CALCULATIONS [J].

BRUNA, PJ ;

DOHMANN, H ;

ANGLADA, J ;

KRUMBACH, V ;

PEYERIMHOFF, SD ;

BUENKER, RJ .

JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM, 1983, 10 :309-318

[2] INFRARED-EMISSION BAND SPECTRUM OF SI-2 [J].

DAVIS, SP ;

BRAULT, JW .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1987, 4 (01) :20-25

[3] THE SPECTRUM OF THE SI-2 MOLECULE [J].

DOUGLAS, AE .

CANADIAN JOURNAL OF PHYSICS, 1955, 33 (12) :801-810

[4] STUDY OF THE LOW-LYING ELECTRONIC STATES OF SI-2 AND SI-2- USING NEGATIVE-ION PHOTODETACHMENT TECHNIQUES [J].

KITSOPOULOS, TN ;

CHICK, CJ ;

ZHAO, Y ;

NEUMARK, DM .

JOURNAL OF CHEMICAL PHYSICS, 1991, 95 (03) :1441-1448

[5] THE ELECTRONIC STATES OF SI-2 AND SI-2- AS REVEALED BY PHOTOELECTRON-SPECTROSCOPY [J].

NIMLOS, MR ;

HARDING, LB ;

ELLISON, GB .

JOURNAL OF CHEMICAL PHYSICS, 1987, 87 (09) :5116-5124

[6] ELECTRONIC-STRUCTURES OF THE NEGATIVE-IONS SI-2--SI-10- - ELECTRON-AFFINITIES OF SMALL SILICON CLUSTERS [J].

RAGHAVACHARI, K ;

ROHLFING, CM .

JOURNAL OF CHEMICAL PHYSICS, 1991, 94 (05) :3670-3678

[7] ON THE BEHAVIOR OF CROSS SECTIONS NEAR THRESHOLDS [J].

WIGNER, EP .

PHYSICAL REVIEW, 1948, 73 (09) :1002-1009

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