COMPUTER-SIMULATION OF ION-IMPLANTATION IN AMORPHOUS TARGETS

被引：0
作者：
HAGGMARK, LG [1 ]
机构：
[1] SANDIA NATL LAB,DIV THEORET,LIVERMORE,CA 94550
来源：
JOURNAL OF METALS | 1981年 / 33卷 / 09期
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D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
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页码：A9 / A9
页数：1
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