EDGE PLASMA BEHAVIOR DURING AUXILIARY HEATING IN THE COMPACT HELICAL SYSTEM (CHS)

被引：15

作者：

MORISAKI, T ^{[1
]}

KOMORI, A ^{[1
]}

NISHIMURA, K ^{[1
]}

MORITA, S ^{[1
]}

MOTOJIMA, O ^{[1
]}

IGUCHI, H ^{[1
]}

KAWAI, Y ^{[1
]}

MATSUOKA, K ^{[1
]}

OKAMURA, S ^{[1
]}

YAMADA, H ^{[1
]}

机构：

[1] KYUSHU UNIV, INTERDISCIPLINARY GRAD SCH ENGN SCI, KASUGA, FUKUOKA 816, JAPAN

来源：

PLASMA PHYSICS AND CONTROLLED FUSION | 1995年 / 37卷 / 07期

关键词：

D O I：

10.1088/0741-3335/37/7/008

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The temporal evolution of radial profiles of electron density and its fluctuations during NBI or NBI plus ICRF heating has been measured in the CHS edge plasma with a thermal neutral lithium beam probe. The large outward shift of plasma boundary is observed during the NBI heating, and when the plasma boundary does not move outwards in spite of increasing plasma pressure, the fluctuation level is found to decrease just outside the last closed flux surface. It is also shown that the edge plasma is stabilized by the ICRF in the NBI-sustained plasma and the vague edge plasma is removed at the same time, and that, once the vague plasma is removed, it cannot be produced again even if the ICRF is turned off.

引用

页码：787 / 797

页数：11

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