THE BEHAVIOR OF INCORPORATED IMPURITIES IN TANTALUM ANODIC OXIDE-FILMS AT THE DIELECTRIC-BREAKDOWN

被引：5

|

作者：

ARIFUKU, F

YONEYAMA, H

TAMURA, H

机构：

来源：

ELECTROCHIMICA ACTA | 1980年 / 25卷 / 06期

关键词：

D O I：

10.1016/0013-4686(80)90039-0

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：863 / 865

页数：3

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