A COMPARATIVE-STUDY OF PHASE-STABILITY AND FILM MORPHOLOGY IN THIN-FILM CO/GAAS,RH/GAAS,IR/GAAS,NI/GAAS,PD/GAAS, AND PT/GAAS SYSTEMS

被引：92

作者：

SANDS, T ^{[1
]}

KERAMIDAS, VG ^{[1
]}

YU, KM ^{[1
]}

WASHBURN, J ^{[1
]}

KRISHNAN, K ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,BERKELEY,CA 94720

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.339553

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2070 / 2079

页数：10

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