RECRYSTALLIZATION OF BURIED AMORPHOUS LAYERS AND ASSOCIATED ELECTRICAL EFFECTS IN P+-IMPLANTED SI

被引：36
作者：
SADANA, DK
WASHBURN, J
BOOKER, GR
机构：
[1] UNIV CALIF BERKELEY,DEPT MAT SCI & MINERAL ENGN,BERKELEY,CA 94720
[2] UNIV OXFORD,DEPT MET & MAT SCI,OXFORD OX1 3PH,ENGLAND
来源：
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1982年 / 46卷 / 06期
关键词：
D O I：
10.1080/01418638208223548
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：611 / 633
页数：23
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