IN-SITU ELLIPSOMETRIC DIAGNOSTICS FOR CONTROLLED GROWTH OF METAL-OXIDES WITH SURFACE CHEMICAL-REACTIONS

被引:21
作者
KUMAGAI, H
TOYODA, K
机构
[1] Laser Science Research Group, The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama, 351-01
关键词
D O I
10.1016/0169-4332(94)90262-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In situ diagnostics for controlled growth of metal oxides such as aluminum oxide with surface chemical reactions was successfully conducted with a spectroscopic ellipsometer. It was found that the self-limiting growth of aluminum oxide films at room temperature was clearly observed with alternate dosing of binary vapors of trimethylaluminum and hydrogen peroxide.
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页码:481 / 486
页数:6
相关论文
共 16 条
[11]   MOLECULAR LAYER EPITAXY [J].
NISHIZAWA, J ;
ABE, H ;
KURABAYASHI, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (05) :1197-1200
[12]   NEW APPROACH TO THE ATOMIC LAYER EPITAXY OF GAAS USING A FAST GAS-STREAM [J].
OZEKI, M ;
MOCHIZUKI, K ;
OHTSUKA, N ;
KODAMA, K .
APPLIED PHYSICS LETTERS, 1988, 53 (16) :1509-1511
[13]   CORRECTION FOR NONLINEARITY AND POLARIZATION-DEPENDENT SENSITIVITY IN THE DETECTION SYSTEM OF ROTATING ANALYZER ELLIPSOMETERS [J].
RUSSEV, SH .
APPLIED OPTICS, 1989, 28 (08) :1504-1507
[14]  
SUNTOLA T, 1984, 16TH C SOL STAT DEV, P647
[15]   GAAS ATOMIC LAYER EPITAXY BY HYDRIDE VPE [J].
USUI, A ;
SUNAKAWA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (03) :L212-L214
[16]   INFRARED STUDIES OF REACTIONS BETWEEN SILICA AND TRIMETHYLALUMINUM [J].
YATES, DJC ;
DEMBINSK.GW ;
KROLL, WR ;
ELLIOTT, JJ .
JOURNAL OF PHYSICAL CHEMISTRY, 1969, 73 (04) :911-&