ELLIPSOMETRIC MEASUREMENT OF DAMAGE DEPTH PROFILES FOR ION-BEAM PROCESSED SI SURFACE-LAYER

被引：5
作者：
OHIRA, F
ITAKURA, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1982年 / 21卷 / 01期
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D O I：
10.1143/JJAP.21.42
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：42 / 46
页数：5
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