TETRAHYDROPYRANYL AND TETRAHYDROFURANYL PROTECTED POLYHYDROXYSTYRENES IN CHEMICAL AMPLIFICATION RESIST SYSTEMS FOR KRF EXCIMER LASER LITHOGRAPHY

被引：0
|
作者：
HAYASHI, N [1 ]
HESP, SMA [1 ]
UENO, T [1 ]
TORIUMI, M [1 ]
IWAYANAGI, T [1 ]
NONOGAKI, S [1 ]
机构：
[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1989年 / 198卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：93 / PMSE
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