KINETICS OF CHEMICAL VAPOR-DEPOSITION

被引：7

作者：

SUBRAHMANYAM, J ^{[1
]}

LAHIRI, AK ^{[1
]}

ABRAHAM, KP ^{[1
]}

机构：

[1] INDIAN INST SCI,DEPT MET,BANGALORE 560012,INDIA

来源：

关键词：

D O I：

10.1149/1.2129905

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1394 / 1399

页数：6

共 10 条

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BESMANN, TM
SPEAR, KE
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) : 786 - 790
[3] BIRD B, 1960, TRANSPORT PHENOMENA
[4] BLOCHER JM, 1967, P C CVD REFRACTORY M, P3
[5] CAMPBELL WB, 1966, CHEM ENG PROG, V62, P68
[6] Hirth J. P., 1963, CONDENSATION EVAPORA
[7] CHEMICAL VAPOR-DEPOSITION OF A TIC COATING ON A CEMENTED-CARBIDE CUTTING TOOL
LEE, M
RICHMAN, MH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (07) : 993 - 996
[8] NOLANG BI, 1976, J CRYST GROWTH, V34, P198, DOI 10.1016/0022-0248(76)90130-5
[9] SHERWOOD TK, 1960, J HEAT TRANSFER, P313
[10] SUBRAHMANYAM J, 1977, THESIS INDIAN I SCI