CATALYTIC CHEMICAL VAPOR-DEPOSITION METHOD TO PREPARE HIGH-QUALITY HYDROFLUORINATED AMORPHOUS-SILICON

被引：20

作者：

MATSUMURA, H

IHARA, H

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 11期

关键词：

D O I：

10.1063/1.342069

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6505 / 6509

页数：5

共 15 条

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