BROAD-BEAM ION SOURCES - PRESENT STATUS AND FUTURE-DIRECTIONS

被引：45

作者：

KAUFMAN, HR ^{[1
]}

机构：

[1] COMMONWEALTH SCI CORP,ALEXANDRIA,VA 22314

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573810

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：764 / 771

页数：8

共 14 条

[1]

CUOMO JJ, 1984, Patent No. 4466403

[2] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].

HARPER, JME ;

CUOMO, JJ ;

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756

[3]

HARPER JME, 1984, ION BOMBARDMENT MODI, P127

[4] ION MILLING (ION-BEAM ETCHING), 1975-1978 - BIBLIOGRAPHY [J].

HAWKINS, DT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (04) :1051-1071

[5] ION MILLING (ION-BEAM ETCHING), 1954-1975 - BIBLIOGRAPHY [J].

HAWKINS, DT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1389-1398

[6]

Kaufman H.R., 1974, ADV ELECT ELECT PHYS, V36, P265

[7] TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING [J].

KAUFMAN, HR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :272-276

[8] ION-SOURCE DESIGN FOR INDUSTRIAL APPLICATIONS [J].

KAUFMAN, HR ;

ROBINSON, RS .

AIAA JOURNAL, 1982, 20 (06) :745-760

[9] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J].

KAUFMAN, HR ;

CUOMO, JJ ;

HARPER, JME .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :725-736

[10] DEVELOPMENTS IN BROAD-BEAM, ION-SOURCE TECHNOLOGY AND APPLICATIONS [J].

KAUFMAN, HR ;

HARPER, JME ;

CUOMO, JJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :764-767

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