ELLIPSOMETRIC INSITU STUDY OF THE TITANIUM SURFACES DURING THE ANODIZATION

The titanium surfaces immersed in 0. 5 mol.dm-3 H2SO4 and anodized in the voltage region from 0 to 100 V have been studied by in situ ellipsometric measurements. The thickness, inhomogeneity, and porosity of the formed films rise with increasing applied voltage. A computational method is presented for obtaining both the refractive indices and thickness of an unknown film on a reflecting substrate of known optical constants. The complex index of refraction and thickness of generated films were calculated comparing the theoretical computed curve with experimental loci DELTA and PSI obtained from in situ ellipsometric measurements.