BREAKDOWN OF OXIDE-FILMS ON NICKEL

被引：64

作者：

MACDOUGALL, B ^{[1
]}

COHEN, M ^{[1
]}

机构：

[1] NATL RES COUNCIL CANADA,DIV CHEM,OTTAWA K1A 0R9,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 08期

关键词：

D O I：

10.1149/1.2133525

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1185 / 1190

页数：6

共 50 条

[41] PHOTOENHANCED MOCVD OF OXIDE-FILMS
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UNVALA, BA
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (04) : C231 - C231
[42] THIN SUPERCONDUCTING OXIDE-FILMS
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[43] STRUCTURE OF OXIDE-FILMS ON SILICON
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[44] ANODIC OXIDE-FILMS ON GAP
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[45] THIN OXIDE-FILMS ON IRON
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[46] ANODIC OXIDE-FILMS ON TITANIUM
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[47] BREAKDOWN PHENOMENA DURING THE GROWTH OF ANODIC OXIDE-FILMS ON ZIRCONIUM METAL - INFLUENCE OF EXPERIMENTAL PARAMETERS ON ELECTRICAL AND MECHANICAL BREAKDOWN
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[48] REFLECTANCE SPECTROSCOPY (UV-VIS-NIR, FTIR) OF OXIDE-FILMS - OXIDE LAYERS ON COPPER AND NICKEL
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[49] AUGER-ELECTRON SPECTROSCOPY OF ANODIC OXIDE-FILMS ON NICKEL-COPPER ALLOYS
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[50] STUDY OF PATTERNS OF BREAKDOWN PROCESSES IN ANODIC OXIDE-FILMS FORMED ON ALUMINUM IN SULFURIC-ACID
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