DEVICE CHARACTERIZATION OF A HIGH-PERFORMANCE 0.25-MU-M CMOS TECHNOLOGY

被引:0
作者
WOERLEE, PH
JUFFERMANS, CAH
LIFKA, H
MANDERS, WH
POMP, HG
PAULZEN, GM
WALKER, AJ
WOLTJER, R
机构
[1] Philips Research Laboratories P.O. Box 80000
关键词
D O I
10.1016/0167-9317(92)90386-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The device design, fabrication and characterisation of NMOS and PMOS transistors of a 0.25 mum CMOS technology will be discussed. The devices were optimized for a reduced power supply voltage of 2.5 V. High quality devices with good control of short channel effects were obtained. Hot carrier degradation experiments showed that NMOS devices could operate at 2.5 V supply voltage. The delay per stage of a non-optimized 51-stage ringoscillators fabricated in the 0.25 mum process was 62 ps at 2.5 V supply voltage which is a 1.5 times improvement over the delay obtained in a 0.5 mum CMOS technology at 3.3V.
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页码:21 / 24
页数:4
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