ELECTRON MICROSCOPIC INVESTIGATION OF TRANSVERSE SECTIONS OF THIN FILMS ON SOLID SUBSTRATES

被引:12
作者
BACH, H
SCHRODER, H
机构
[1] Jenaer Glaswerk Schott and Gen., Mainz
来源
ZEITSCHRIFT FUR PHYSIK | 1969年 / 224卷 / 1-3期
关键词
D O I
10.1007/BF01392239
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A method is described which allows to prepare transverse sections of thin films by means of an ion etching technique so that transmission electron micrographs of the film structure can be carried out. A section through a 6-layered optical film with a total thickness of 0.62 μm is shown as an example. © 1969 Springer-Verlag.
引用
收藏
页码:122 / &
相关论文
共 14 条
[1]  
Bach H., 1968, THIN SOLID FILMS, V1, P255
[2]  
BACH H, THESIS
[3]  
BACH H, 1964, BOSCH TECHN BERICHTE, P10
[4]   ELECTRON MICROSCOPY OF DISLOCATIONS AND OTHER DEFECTS IN SAPPHIRE AND IN SILICON CARBIDE THINNED BY SPUTTERING [J].
DRUM, CM .
PHYSICA STATUS SOLIDI, 1965, 9 (02) :635-&
[5]  
HASS G, 1969, PHYSICS THIN FILM ED, V5
[6]   PREPARATION OF THIN SECTIONS BY ION BOMBARDMENT FOR TRANSMISSION ELECTRON MICROSCOPY [J].
HIRTHE, WM ;
MELVILLE, AT ;
WACKMAN, PH .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1967, 38 (02) :223-&
[7]  
KELLER R, 1949, HELV PHYS ACTA, V22, P79
[8]  
LUTZ H, 1964, Z NATURFORSCH A, V19, P1979
[9]   THICKNESS ESTIMATION OF CARBON FILMS BY ELECTRON MICROSCOPY OF TRANSVERSE SECTIONS AND OPTICAL DENSITY MEASUREMENTS [J].
MORETZ, RC ;
JOHNSON, HM ;
PARSONS, DF .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5421-&
[10]  
PAWLJENKO OP, 1965, IZV AKAD NAUK SSSR F, V29, P626