ENGINEERING SOFTWARE - BELOW THE HALF-MICRON MARK

被引:0
|
作者
TIWARY, G
机构
[1] EPIC Design Technology Inc., Santa Clara, Calif.
关键词
D O I
10.1109/6.328731
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
[No abstract available]
引用
收藏
页码:84 / 87
页数:4
相关论文
共 50 条
  • [1] HILLOCKS ON HALF-MICRON ALUMINUM LINES
    PICO, CA
    BONIFIELD, TD
    JOURNAL OF MATERIALS RESEARCH, 1991, 6 (09) : 1817 - 1819
  • [2] A HALF-MICRON CMOS LOGIC GENERATION
    KOBURGER, CW
    CLARK, WF
    ADKISSON, JW
    ADLER, E
    BAKEMAN, PE
    BERGENDAHL, AS
    BOTULA, AB
    CHANG, W
    DAVARI, B
    GIVENS, JH
    HANSEN, HH
    HOLMES, SJ
    HORAK, DV
    LAM, CH
    LASKY, JB
    LUCE, SE
    MANN, RW
    MILES, GL
    NAKOS, JS
    NOWAK, EJ
    SHAHIDI, G
    TAUR, Y
    WHITE, FR
    WORDEMAN, MR
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1995, 39 (1-2) : 215 - 227
  • [3] BREATHING OF HALF-MICRON AEROSOLS .1. EXPERIMENTAL
    DAVIES, CN
    HEYDER, J
    RAMU, MCS
    JOURNAL OF APPLIED PHYSIOLOGY, 1972, 32 (05) : 591 - &
  • [4] KRF EXCIMER LASER LITHOGRAPHY FOR HALF-MICRON DEVICES
    OGAWA, K
    SASAGO, M
    ENDO, M
    NAKAGAWA, H
    ISHIHARA, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C432 - C432
  • [5] PROGRESS IN I-LINE STEPPER TECHNOLOGY FOR HALF-MICRON
    GREENEICH, J
    WITTEKOEK, S
    KATZ, B
    VANDENBRINK, M
    OPTICAL/LASER MICROLITHOGRAPHY II, 1989, 1088 : 194 - 207
  • [6] ELECTRON-BEAM PROXIMITY PRINTING OF HALF-MICRON DEVICES
    MEISSNER, K
    HAUG, W
    SILVERMAN, S
    SONCHIK, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1443 - 1447
  • [7] PILOT PRODUCTION OF HALF-MICRON X-RAY MASKS
    HUGHES, G
    DOYLE, G
    FOSS, G
    GORBACHENKO, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1570 - 1574
  • [8] ULTRAHIGH RESOLUTION POSITIVE WORKING PHOTORESIST FOR HALF-MICRON PHOTOLITHOGRAPHY
    SATOH, Y
    KOHARA, H
    TOKUTAKE, N
    TAKAHASHI, K
    NAKAYAMA, T
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI, 1989, 1086 : 352 - 356
  • [9] HALF-MICRON CMOS ON ULTRA-THIN SILICON ON INSULATOR
    WOERLEE, PH
    VANOMMEN, AH
    LIFKA, H
    JUFFERMANS, CAH
    PLAJA, L
    KLAASSEN, FM
    1989 INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST, 1989, : 821 - 824
  • [10] Planar yoke write head for half-micron track width
    Oyama, N
    Kuwashima, T
    Matsuda, O
    Kamijima, A
    Asanuma, Y
    Iijima, A
    Sasaki, Y
    IEEE TRANSACTIONS ON MAGNETICS, 2000, 36 (05) : 2509 - 2513