AFTERGLOW CHEMICAL VAPOR-DEPOSITION OF SIO2

被引：0
|
作者：
JACKSON, RL [1 ]
SPENCER, JE [1 ]
MCGUIRE, JL [1 ]
HOFF, AM [1 ]
机构：
[1] PENN STATE UNIV,DEPT ELECT ENGN,UNIVERSITY PK,PA 16802
来源：
SOLID STATE TECHNOLOGY | 1987年 / 30卷 / 04期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：107 / 111
页数：5
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