HOLOGRAPHIC MULTIPLICATION IN ONE EXPOSURE BY USE OF A MULTIBEAM REFERENCE FIELD

被引：7
作者：
KALESTYN.A [1 ]
机构：
[1] POLITECH WARSAW,INST PHYS,WARSAW 75,POLAND
来源：
APPLIED OPTICS | 1973年 / 12卷 / 08期
关键词：
D O I：
10.1364/AO.12.001946
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：1946 / 1950
页数：5
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