DETERMINATION OF SILICON IN HIGH-PURITY METALS BY RADIOCHEMICAL NAA AND CPAA

被引：10

作者：

SCHMID, W

EGGER, KP

KRIVAN, V

机构：

来源：

JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES | 1988年 / 123卷 / 02期

关键词：

D O I：

10.1007/BF02034916

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：561 / 571

页数：11

共 14 条

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[7] ANALYSIS OF HIGH-PURITY GRAPHITE FOR TRACE-ELEMENTS BY INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION-SPECTROMETRY AFTER CHELATING RESIN PRE-CONCENTRATION [J].

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ANALYTICAL CHEMISTRY, 1983, 55 (02) :403-405

[8] METAL SALT IMPREGNATION OF GRAPHITE TUBES FOR IMPROVED AAS SILICON DETERMINATION [J].

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