ON THE ELEMENTAL DEPENDENCE OF THE ARRIVAL RATE OF THE SPUTTERED PARTICLES IN THE MONTE-CARLO SIMULATION OF THE PARTICLE-TRANSPORT PROCESS IN SPUTTER DEPOSITION

被引：0

作者：

MOTOHIRO, T

TAGA, Y

机构：

来源：

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D O I：

10.1016/0040-6090(89)90662-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L105 / L107

页数：3

共 4 条

[1] MONTE-CARLO SIMULATION OF THE PARTICLE-TRANSPORT PROCESS IN SPUTTER DEPOSITION
MOTOHIRO, T
TAGA, Y
[J]. THIN SOLID FILMS, 1984, 112 (02) : 161 - 173
[2] APPLICATIONS OF MONTE-CARLO SIMULATION IN THE ANALYSIS OF A SPUTTER-DEPOSITION PROCESS
MOTOHIRO, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02): : 189 - 195
[3] MOTOHIRO T, 1986, THESIS TOKYO U, P47
[4] DEPOSITION AND REDEPOSITION IN MAGNETRONS
ROSSNAGEL, SM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3049 - 3054