O2 AND AR PLASMA INTERACTION WITH THIN AULN2 FILMS

被引：0
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作者：
YEH, JTC
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期
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D O I：
10.1116/1.571469
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：372 / 375
页数：4
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