The Si3N4/TiN Interface: An Introduction to a Series of Ultrathin Films Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy

被引：2
作者：
Haasch, Richard T. [1 ,2 ]
Patscheider, Joerg [1 ,2 ,3 ]
Hellgren, Niklas [1 ,2 ,4 ]
Petrov, Ivan [1 ,2 ]
Greene, J. E. [1 ,2 ]
机构：
[1] Univ Illinois, Dept Mat Sci, 104 S Goodwin Ave, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] EMPA, Lab Nanoscale Mat Sci, CH-8600 Dubendorf, Switzerland
[4] Messiah Coll, Dept Math Sci, Grantham, PA 17027 USA
来源：
SURFACE SCIENCE SPECTRA | 2012年 / 19卷 / 01期
关键词：
D O I：
10.1116/11.20121108
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
[No abstract available]
引用
收藏
页码：30 / 32
页数：3
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