ANISOTROPIC SURFACE MOBILITY OF ALUMINUM ON SI(111) DURING THE INITIAL-STAGE OF VAPOR-DEPOSITION

被引：9
作者：
LEVENSON, LL
USUI, H
YAMADA, I
TAKAGI, T
SWARTZLANDER, AB
机构：
[1] KYOTO UNIV,ION BEAM ENGN EXPTL LAB,SAKYO KU,KYOTO 606,JAPAN
[2] SOLAR ENERGY RES INST,GOLDEN,CO 80401
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.576255
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1206 / 1209
页数：4
相关论文
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