CHARACTERISTICS OF AUGENI OHMIC CONTACTS TO GAAS

被引:1
作者
HEIBLUM, M [1 ]
NATHAN, MI [1 ]
CHANG, CA [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1109/T-ED.1981.20555
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:1234 / 1235
页数:2
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[2]   PHOTOSENSITIVE IMPURITY-ASSISTED TUNNELING (AU, 77 DEGREES K) IN GAAS TUNNEL DIODES [J].
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DUKE, CB .
PHYSICAL REVIEW LETTERS, 1970, 24 (11) :589-&
[3]  
VIDIMARI F, 1979, ELECTRON LETT, V15, P675