NEW ROTATING TARGET HOLDER FOR LASER ABLATION AND ION-BEAM SPUTTER DEPOSITION OF MULTICOMPONENT AND MULTILAYERED THIN-FILMS

A versatile ultrahigh vacuum rotating target holder has been designed and constructed for use in ion beam sputter and laser ablation deposition systems for producing multicomponent and/or multilayered thin films. The device features a capability for rotating the targets continuously during exposure to the beams to minimize the development of an undesirable surface topography that otherwise would occur if the targets were still during irradiation. In addition, each individual target holder can be tilted at a predetermined angle. The combined tilting and rotation produces a wobbling movement of the target surface that can be used advantageously to achieve a more uniform distribution of the materials ejected from the targets, which in turn can result in better composition and thickness uniformity of thin films over large area substrates. The device can be baked up to 150-degrees-C depending on the choice of driving motor.