PLASMA POLYMERIZATION OF ALLYLAMINE/3-AMINOPROPYLTRIETHOXYSILANE MIXTURES - SURFACE NITROGEN CONTROL

被引：13

作者：

BARBAROSSA, V ^{[1
]}

CONTARINI, S ^{[1
]}

ZANOBI, A ^{[1
]}

机构：

[1] ENIRICERCHE SPA,ENI RES CTR,I-00016 MONTEROTONDO,ITALY

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1992年 / 44卷 / 11期

关键词：

D O I：

10.1002/app.1992.070441110

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A study has been conducted to determine the effects of gas-feed composition and RF power on the deposition rate and on the surface nitrogen content of thin films produced by plasma polymerization of allylamine/3-amino-propyltriethoxysilane (AA/3-APTS) mixtures. It has been found that while the deposition rate decreases slightly by increasing the AA content in the mixture, the surface nitrogen content, determined by XPS as N : Si molar ratios, increases up to a value of 8 : 1. Moreover, the nitrogen increase is not linear with the AA concentration and a maximum in the N/Si values is found for AA/APTS ratios close to 3 : 1, at all RF powers. The discussion on the polymerization mechanism for the mixture is based on evaluating and combining the behavior of each component, when plasma-polymerized alone in similar conditions.

引用

页码：1951 / 1957

页数：7

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