EXHAUST-GAS INCINERATION AND THE COMBUSTION OF ARSINE AND PHOSPHINE

[1] EXPERIMENTAL INVESTIGATION OF GAS-PHASE IN A CHEMICAL VAPOR-DEPOSITION REACTION - APPLICATION TO SILANE-AMMONIA REACTION LEADING TO SILICON-NITRIDE DEPOSITS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : 487 - 492

[2] COTTON ML, 1977, METALLURGICAL SOC CI, P205

[3] HOACKE G, 1988, J ELECTROCHEM SOC, V135, P715

[4] HOTTEL HC, 1949, 3RD S COMB

[5] STRATER K, 1968, RCA REV, V29, P618

[6] FILMS FROM THE LOW-TEMPERATURE OXIDATION OF SILANE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1728 - 1731

[7] TOBIN PJ, 1980, J ELECTROCHEM SOC, V127

[8] 1983, INVESTIGATION OXIDAT

[1] EXPERIMENTAL INVESTIGATION OF GAS-PHASE IN A CHEMICAL VAPOR-DEPOSITION REACTION - APPLICATION TO SILANE-AMMONIA REACTION LEADING TO SILICON-NITRIDE DEPOSITS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : 487 - 492

[2] COTTON ML, 1977, METALLURGICAL SOC CI, P205

[3] HOACKE G, 1988, J ELECTROCHEM SOC, V135, P715

[4] HOTTEL HC, 1949, 3RD S COMB

[5] STRATER K, 1968, RCA REV, V29, P618

[6] FILMS FROM THE LOW-TEMPERATURE OXIDATION OF SILANE [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) : 1728 - 1731

[7] TOBIN PJ, 1980, J ELECTROCHEM SOC, V127

[8] 1983, INVESTIGATION OXIDAT