ESR SIGNATURES OF DEFECTS NEAR SI-SIO2 INTERFACE

被引:3
|
作者
POINDEXTER, EH [1 ]
HELBERT, JN [1 ]
WAGNER, BE [1 ]
CAPLAN, PJ [1 ]
机构
[1] USA,ELECTR COMMAND,FT MONMOUTH,NJ 07703
关键词
D O I
10.1109/T-ED.1977.18979
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1217 / 1217
页数:1
相关论文
共 50 条
  • [1] ESR CENTERS AND CHARGE DEFECTS NEAR SI-SIO2 INTERFACE
    POINDEXTER, EH
    AHLSTROM, ER
    CAPLAN, PJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (03): : 456 - 456
  • [2] THEORY OF OXIDE DEFECTS NEAR THE SI-SIO2 INTERFACE
    CHU, AX
    FOWLER, WB
    PHYSICAL REVIEW B, 1990, 41 (08): : 5061 - 5066
  • [3] INDIVIDUAL DEFECTS AT THE SI-SIO2 INTERFACE
    KIRTON, MJ
    UREN, MJ
    COLLINS, S
    SCHULZ, M
    KARMANN, A
    SCHEFFER, K
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (12) : 1116 - 1126
  • [4] AMPHOTERIC DEFECTS AT THE SI-SIO2 INTERFACE
    CHANG, ST
    WU, JK
    LYON, SA
    APPLIED PHYSICS LETTERS, 1986, 48 (10) : 662 - 664
  • [5] DEFECTS IN SILICON NEAR THE SI-SIO2 INTERFACE PRODUCED BY SI+ IONS IMPLANTATION
    GALKIN, GN
    BOBROVA, EA
    ABBASOVA, RU
    VAVILOV, VS
    CRYSTAL LATTICE DEFECTS, 1982, 9 (04): : 189 - 194
  • [6] CHARACTERISTIC ELECTRONIC DEFECTS AT THE SI-SIO2 INTERFACE
    JOHNSON, NM
    BIEGELSEN, DK
    MOYER, MD
    CHANG, ST
    POINDEXTER, EH
    CAPLAN, PJ
    APPLIED PHYSICS LETTERS, 1983, 43 (06) : 563 - 565
  • [7] DEFECTS AT SI-SIO2 INTERFACE - FACT, FICTION, AND FANCY
    BLANC, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C138 - C138
  • [9] Si-SiO2 electronic interface roughness as a consequence of Si-SiO2 topographic interface roughness
    LSI/PEE/EPUSP, Sao Paulo, Brazil
    J Electrochem Soc, 3 (1021-1025):
  • [10] ESR INVESTIGATION OF THE SI-SIO2 SYSTEM
    KROPMAN, D
    KARNER, T
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1993, 136 (01): : 125 - 129