THERMAL-OXIDATION KINETICS OF SILICON IN PYROGENIC H2O AND 5-PERCENT HCL-H2O MIXTURES

被引：92

作者：

DEAL, BE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 04期

关键词：

D O I：

10.1149/1.2131502

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：576 / 579

页数：4

共 18 条

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[4] KINETICS OF THERMAL-OXIDATION OF SILICON IN O2/H2O AND O2/CL2 MIXTURES [J].

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[7] KINETICS OF THERMAL-OXIDATION OF SILICON IN O2-HCL MIXTURES [J].

HESS, DW ;

DEAL, BE .

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[8] KINETICS OF THERMAL GROWTH OF HCI-O2 OXIDES ON SILICON [J].

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[9] EFFECT OF HCL AND CL2 ON THERMAL OXIDATION OF SILICON [J].

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