OXIDATION BEHAVIOR OF SILICON YTTRIUM OXYNITRIDE

被引：12

作者：

VEYRET, JB ^{[1
]}

VANDEVOORDE, M ^{[1
]}

BILLY, M ^{[1
]}

机构：

[1] UNIV LIMOGES,CERAM NOUVELLES LAB,F-87100 LIMOGES,FRANCE

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1992年 / 75卷 / 12期

关键词：

D O I：

10.1111/j.1151-2916.1992.tb04423.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The oxidation behavior of the silicon yttrium oxynitride Y10Si7O23N4, so-called H-phase, in the temperature range 700-1400-degrees-C has been investigated. A nitrogen retention phenomenon in the oxidation product Y4,67(SiO4)3O (O-apatite) is discussed. The H-phase is one of the four quaternary compounds identified in hot-pressed Si3N4 materials fabricated within the Si3N4-SiO2-Y2O3 pseudoternary system.

引用

页码：3289 / 3292

页数：4

共 8 条

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