THICKNESS PROFILE DETERMINATION OF THIN-FILM MASKS FOR USE IN ELECTRON-BEAM LITHOGRAPHY

被引：0

作者：

CLARK, WRK ^{[1
]}

CHAPMAN, JN ^{[1
]}

机构：

[1] UNIV GLASGOW,DEPT NAT PHILOSOPHY,GLASGOW G12 8QQ,SCOTLAND

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D O I：

10.1016/S0304-3991(81)80156-8

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：211 / 218

页数：8

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