DECOMPOSITION OF NABH4 IN AN ELECTROLESS NICKEL BATH

被引:20
作者
LO, YL [1 ]
HWANG, BJ [1 ]
机构
[1] NATL TAIWAN INST TECHNOL,DEPT CHEM ENGN,TAIPEI 10672,TAIWAN
关键词
D O I
10.1021/ie00025a008
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
To study the mechanism and kinetics of the decomposition of NaBH4 in an electroless nickel bath, we investigate the effects of concentration of NiCl2, concentration of NH4Cl, pH, temperature, and amount of Ni powder on the rate of decomposition of NaBH4. The results indicate that the decomposition of NaBH4 is accelerated by H+ ions and Ni2+ ions. The kinetic orders of H+ and Ni2+ in the NiCl2/Na2C4H4O6 system are 0.4 and 1, respectively, but the kinetic order of H+ is 0.56 in the NiCl2/Na2C4H4O6 + NH4Cl system. The rate of decomposition decreased with addition of NH4Cl. The results show that the rate of decomposition of NaBH4 is accelerated by the presence of nickel powder in the bath. The experimental results and theoretical predictions of the model developed from the proposed mechanism are consistent. The kinetic equation for decomposition of NaBH4 in electroless Ni bath is expressed as [(1/v)(dN(H2)/dt)]o = 4(k1W(Ni,0) + k2C(H+,0a1))C(BH4-,0) + 2(k6W(Ni,0) + k7C(H+,011))C(BH4-,0)C(Ni2+,0) in which k1, k2, k6, and k7 are 32.25 g-1 min-1, 2.49 X 10(5) M-1 min-1, 2.43 X 10(3) g-1 M-1 min-1, and 5.63 X 10(6) M-2 min-1, respectively. al is 0.4 for the NaBH4 system and NiCl2/Na2C4H4O6 system and 0.56 for the NiCI2/Na2C4H4O6 + NH4Cl system.
引用
收藏
页码:56 / 61
页数:6
相关论文
共 10 条
[1]  
BERZINS T, 1962, Patent No. 3045334
[2]  
BERZINS T, 1963, Patent No. 3096182
[3]  
DONALD WB, 1979, PLAT SURF FINISH, V11, P18
[4]  
ELMALLAH AT, 1989, MET FINISH, V87, P39
[5]  
Gawrilov G. G., 1979, CHEM ELECTROLESS NIC
[6]   ELECTROLESS DEPOSITION OF NICKEL-BORON ALLOYS - MECHANISM OF PROCESS, STRUCTURE, AND SOME PROPERTIES OF DEPOSITS [J].
GORBUNOVA, KM ;
IVANOV, MV ;
MOISEEV, VP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) :613-618
[7]  
HENRY PJ, 1984, MET FINISH, V10, P45
[8]  
MATSUOKA M, 1974, DENKI KAGAKU, V42, P424
[9]   STUDY OF THE CONTACT RESISTANCE OF ELECTROLESS NI-B DOPED SILICON USING SODIUM-BOROHYDRIDE AS REDUCING AGENT [J].
SINGH, BK ;
CHATTERJEE, A ;
DAW, AN ;
MITRA, RN .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (03) :785-787
[10]  
TANABE Y, 1972, DENKI KAGAKU, V23, P642