PROTON NMR-STUDIES OF ANNEALED PLASMA-DEPOSITED AMORPHOUS SI-H FILMS

被引：72

作者：

REIMER, JA ^{[1
]}

VAUGHAN, RW ^{[1
]}

KNIGHTS, JC ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

SOLID STATE COMMUNICATIONS | 1981年 / 37卷 / 02期

关键词：

D O I：

10.1016/0038-1098(81)90734-1

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：161 / 164

页数：4

共 50 条

[1] PROTON MAGNETIC-RESONANCE SPECTRA OF PLASMA-DEPOSITED AMORPHOUS SI-H FILMS
REIMER, JA
VAUGHAN, RW
KNIGHTS, JC
PHYSICAL REVIEW LETTERS, 1980, 44 (03) : 193 - 196
[2] ROLE OF ARGON INVOLVED IN PLASMA-DEPOSITED AMORPHOUS SI-H FILMS
TANAKA, K
YAMASAKI, S
NAKAGAWA, K
MATSUDA, A
OKUSHI, H
MATSUMURA, M
IIZIMA, S
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 475 - 480
[3] THICKNESS DEPENDENCE OF THE PROPERTIES OF PLASMA-DEPOSITED A-SI-H FILMS - NMR-STUDIES
BOYCE, JB
THOMPSON, MJ
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1984, 66 (1-2) : 127 - 132
[4] RECOMBINATION IN PLASMA-DEPOSITED AMORPHOUS SI-H - LUMINESCENCE DECAY
TSANG, C
STREET, RA
PHYSICAL REVIEW B, 1979, 19 (06): : 3027 - 3040
[5] ANALYSIS OF SI-H IN PLASMA-DEPOSITED FILM BY FTIR
NISHIMOTO, A
JINTATE, S
NISHIMURA, I
YASUOKA, A
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) : C393 - C393
[6] DEUTERON AND PROTON NMR IN PLASMA-DEPOSITED AMORPHOUS-SILICON
LEOPOLD, DJ
COUGHLAN, BS
FEDDERS, PA
NORBERG, RE
BOYCE, JB
KNIGHTS, JC
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1984, 66 (1-2) : 121 - 126
[7] A GEMINATE RECOMBINATION MODEL FOR PHOTO-LUMINESCENCE DECAY IN PLASMA-DEPOSITED AMORPHOUS SI-H
NOOLANDI, J
HONG, KM
SOLID STATE COMMUNICATIONS, 1980, 34 (01) : 45 - 48
[8] MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS
KNIGHTS, JC
LUJAN, RA
APPLIED PHYSICS LETTERS, 1979, 35 (03) : 244 - 246
[9] PROTON-MAGNETIC-RESONANCE STUDIES OF MICROSTRUCTURE IN PLASMA-DEPOSITED AMORPHOUS-SILICON-HYDROGEN FILMS
REIMER, JA
VAUGHAN, RW
KNIGHTS, JC
PHYSICAL REVIEW B, 1981, 24 (06): : 3360 - 3370
[10] AMORPHOUS SI-H FILMS AND APPLICATIONS
不详
SOLID STATE TECHNOLOGY, 1984, 27 (05) : 184 - 184

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