共 50 条
[22]
THE KINETICS OF SILICON DIOXIDE CHEMICAL VAPOR-DEPOSITION .1. SURFACE CHEMICAL-REACTIONS
[J].
SURFACE TECHNOLOGY,
1985, 25 (04)
:307-313
[23]
SURFACE CHEMICAL-REACTIONS IN THE METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1988, 6 (03)
:1920-1922
[25]
THIN-FILM PREPARATION BY CHEMICAL VAPOR-DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1973, 10 (01)
:268-&
[27]
CHEMICAL VAPOR-DEPOSITION OF NON-OXIDE CERAMICS
[J].
AMERICAN CERAMIC SOCIETY BULLETIN,
1980, 59 (08)
:824-824
[28]
PREPARATION OF AMORPHOUS ELECTROCHROMIC TUNGSTEN-OXIDE AND MOLYBDENUM OXIDE BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1986, 4 (05)
:2377-2383
[30]
MECHANISM OF SURFACE SELECTIVITY IN ALUMINUM CHEMICAL VAPOR-DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1990, 8 (01)
:103-105