INTERNAL-STRESS IN GROWING ZRO2 FILMS

被引：1

作者：

PANAGOPOULOS, CN

机构：

[1] Laboratory of Physical Metallurgy, National Technical University of Athens, Zografou Campus

来源：

JOURNAL OF THE LESS-COMMON METALS | 1991年 / 168卷 / 02期

关键词：

Anodic Stress - Internal Stress - Valve Metals;

D O I：

10.1016/0022-5088(91)90299-J

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The anodic and open-circuit stresses were studied during the potentiostatic anodic oxidation of zirconium. The anodic stress, i.e. the superposition of growth and electrostrictive stresses, was found to be compressive whereas the open-circuit stress was found to be tensile in the growing zirconium oxide. For a constant value of anodization time, the anodic stress was observed to decrease and the opencircuit stress to increase with increasing thickness of the growing zirconium oxide.

引用

页码：175 / 182

页数：8

共 11 条

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