ATOMIC-SCALE DESORPTION THROUGH ELECTRONIC AND VIBRATIONAL-EXCITATION MECHANISMS

被引:706
作者
SHEN, TC
WANG, C
ABELN, GC
TUCKER, JR
LYDING, JW
AVOURIS, P
WALKUP, RE
机构
[1] UNIV ILLINOIS, BECKMAN INST, URBANA, IL 61801 USA
[2] IBM CORP, DIV RES, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
关键词
D O I
10.1126/science.268.5217.1590
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The scanning tunneling microscope has been used to desorb hydrogen from hydrogen-terminated silicon (100) surfaces. As a result of control of the dose of incident electrons, a countable number of desorption sites can be created and the yield and cross section are thereby obtained. Two distinct desorption mechanisms are observed: (i) direct electronic excitation of the Si-H bond by field-emitted electrons and (ii) an atomic resolution mechanism that involves multiple-vibrational excitation by tunneling electrons at low applied voltages. This vibrational heating effect offers significant potential for controlling surface reactions involving adsorbed individual atoms and molecules.
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页码:1590 / 1592
页数:3
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