Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering

被引:124
作者
Hollenstein, Ch [1 ]
Dorier, J-L [1 ]
Dutta, J. [1 ]
Sansonnens, L. [1 ]
Howling, A. A. [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Ctr Rech Phys Plasmas, CH-1007 Lausanne, Switzerland
关键词
D O I
10.1088/0963-0252/3/3/007
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Experimental identification of the precursors and processes leading to particles is essential for understanding particulate contamination in deposition plasmas. We have investigated particle formation in radiofrequency silane plasmas using light scattering (elastic and inelastic) and quadrupole ion mass spectrometry as complementary plasma diagnostics. Negative ions reach high masses (at least 500amu) and are the only elementary species with a residence time on the scale of the powder formation time. Furthermore, a negative-ion polymerization scheme shows that the densities of high-mass anions are strongly diminished at kilohertz power modulation frequencies, at which reduced powder production is also observed. We conclude that negative Ions are the particle precursors and that initial clusters grow by negative-ion polymerization in silane plasmas. In situ light scattering techniques are described to determine particle size, number density and refractive index self-consistently. Novel, visible photoluminescence measurements from particles suspended in the plasma are also reported. These diagnostics demonstrate that particle evolution proceeds by an agglomeration phase and that the particle properties are different from those of the bulk material early in particle development.
引用
收藏
页码:278 / 285
页数:8
相关论文
共 42 条
[1]  
BLONDEAU JP, 1992, THESIS U ORLEANS
[2]  
Bohren C. F., 2008, ABSORPTION SCATTERIN
[3]   SIMULATION OF PULSED ELECTROPOSITIVE AND ELECTRONEGATIVE PLASMAS [J].
BOSWELL, RW ;
VENDER, D .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :141-143
[4]   PARTICLE GENERATION AND BEHAVIOR IN A SILANE-ARGON LOW-PRESSURE DISCHARGE UNDER CONTINUOUS OR PULSED RADIOFREQUENCY EXCITATION [J].
BOUCHOULE, A ;
PLAIN, A ;
BOUFENDI, L ;
BLONDEAU, JP ;
LAURE, C .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (04) :1991-2000
[5]   High concentration effects in dusty plasmas [J].
Bouchoule, Andre ;
Boufendi, Laifa .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :292-301
[6]   MEASUREMENTS OF PARTICLE-SIZE KINETICS FROM NANOMETER TO MICROMETER SCALE IN A LOW-PRESSURE ARGON-SILANE RADIOFREQUENCY DISCHARGE [J].
BOUFENDI, L ;
PLAIN, A ;
BLONDEAU, JP ;
BOUCHOULE, A ;
LAURE, C ;
TOOGOOD, M .
APPLIED PHYSICS LETTERS, 1992, 60 (02) :169-171
[8]   THE ROLE OF NEGATIVE-IONS IN THE FORMATION OF PARTICLES IN LOW-PRESSURE PLASMAS [J].
CHOI, SJ ;
KUSHNER, MJ .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (02) :853-861
[9]   SHEATH STRUCTURE AROUND PARTICLES IN LOW-PRESSURE DISCHARGES [J].
DAUGHERTY, JE ;
PORTEOUS, RK ;
KILGORE, MD ;
GRAVES, DB .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :3934-3942
[10]   POWDER DYNAMICS IN VERY HIGH-FREQUENCY SILANE PLASMAS [J].
DORIER, JL ;
HOLLENSTEIN, C ;
HOWLING, AA ;
KROLL, U .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1992, 10 (04) :1048-1052