PLATINUM SILICIDE FORMATION UNDER ULTRAHIGH-VACUUM AND CONTROLLED IMPURITY AMBIENTS

被引：79

作者：

CRIDER, CA ^{[1
]}

POATE, JM ^{[1
]}

ROWE, JE ^{[1
]}

SHENG, TT ^{[1
]}

机构：

[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 04期

关键词：

D O I：

10.1063/1.329018

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2860 / 2868

页数：9

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