PLATINUM SILICIDE FORMATION UNDER ULTRAHIGH-VACUUM AND CONTROLLED IMPURITY AMBIENTS

被引：79
作者：
CRIDER, CA [1 ]
POATE, JM [1 ]
ROWE, JE [1 ]
SHENG, TT [1 ]
机构：
[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
来源：
JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 04期
关键词：
D O I：
10.1063/1.329018
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2860 / 2868
页数：9
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