THE DIFFUSION OF SILICON IN GERMANIUM

被引：69
作者：
RAISANEN, J
HIRVONEN, J
ANTTILA, A
机构：
来源：
SOLID-STATE ELECTRONICS | 1981年 / 24卷 / 04期
关键词：
D O I：
10.1016/0038-1101(81)90027-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：333 / 336
页数：4
相关论文
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